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Ion Milling System IM4000Plus : Hitachi High-Tech in

The Hitachi IM4000Plus Ar ion milling system provides two milling configurations in a single instrument. Previously two separate systems were needed to perform both cross section cutting (E-3500) and wide-area sample surface fine polishing (IM3000), but with Hitachi's IM4000Plus, both applications can be run within the same machine.

日立离子研磨仪器 IM4000PLUS : 日立高新技术在中国

日立高新技术日立离子研磨仪器 IM4000。作为扫描电子显微镜进行观察和表面分析(EDX、EBSP等)的前处理设备,将不聚焦的氩离子束照射到样品上,并利用溅射现象,在不施加应力的情况下,研磨样品表面,从而可运用于各种样品的截面制备。

IM4000 Ion Milling System Hitachi High-Tech

Hitachi Ion Milling System Example Application Data (Flat Milling) Example Application Data (Cross-section Milling) Grinding flaws and smearing from mechanical polishing can easily be removed by the IM4000. The metal and alloy interfaces are now clearly visible, including enhanced contrast via ion milling after only five minutes.

IM4000 Ion Milling System Hitachi High

The Hitachi IM4000 Ar ion milling system makes two milling configurations available in a single instrument. While previously two separate systems were needed to perform both, cross section cutting (E-3500) and wide-area sample surface fine polishing (IM3000), Hitachi's new IM4000 now allows to run both applications within the same machine.

Hitachi Ion Milling System

2012-9-11  cross-section milling Sample Observation during Ion Milling The IM4000 has an observation port, for in-situ specimen observation. In addition, when using the stereoscopic microscope (option: Binocular type or Tri-eye type) for sample observation during ion milling, the processing surface can be observed up to 100 times magnification.

Sample Preparation » Hitachi Ion Miller IM4000 Plus

The latest generation of broad ion beam milling systems with improved milling speed. The IM4000Plus Ion Milling System utilizes a broad, low-energy Ar+ ion beam milling method to produce wider, undistorted cross-section milling or flat milling, without applying mechanical stress to the sample.

Nmcf-equipment-IM4000 University of Virginia

2021-1-17  Hitachi IM4000 ion milling system. Flat milling of surfaces for SEM and cross sectional milling using argon ions CALENDAR. Location: Jesser Hall room 131 . The Hitachi IM4000 system is used as the final preparation step to obtain flat samples for SEM and for hardness testing. The IM4000 also allows preparation of large cross sections of samples

IM4000 & IM4000Plus Flatmilling Area MATIN

IM4000 & IM4000Plus FlatmillingTM Area Maximum Area at Minimum Accelerating Voltage . Discussion: Because the TMIM4000 Flatmilling stage and operation is so extremely versatile, the question of the maximum achievable flat-milling area has come up several times since the tools introduction in 2011.

Hitachi Ion Milling System

2013-10-7  3 4 Hitachi Ion Milling System 应用实例(平面研磨) 机械研磨后通过IM4000的浮雕式平面研磨,只用5分钟的时间就可以去除因机械研磨产生的划痕、残留物,从而可以观察到金属层、合金层

離子研磨機Hitachi Ion Milling System

儀器中文名稱: 離子研磨機 儀器英文名稱: Hitachi Ion Milling System 壹、儀器設備說明 (規格):儀器購置日期:106 年7月 儀器設備管理維護單位: 成大材料系 儀器放置地點: 成大材料系館8F-44810 材料織構實驗室 儀器廠牌:Hitachi 儀器型號: IM-4000 Plus

Hitachi Ion Milling System

2012-9-11  The IM4000 can quickly and effectively provide a damage-less flat milling method to enhance mechanically prepared materials. Approximately 5 mm in diameter can be ion-milled uniformly Eliminate flaws and artifacts from traditional mechanical grinding and polishing techniques Diverse range of materials applicable to flat ion milling

ION MILLING IM4000 « Norwegian Micro and Nano

The Hitachi IM4000 Ar ion milling system makes two milling configurations available in a single instrument. While previously two separate systems were needed to perform both, cross section cutting (E-3500) and wide-area sample surface fine polishing (IM3000), Hitachi's new IM4000 now allows to run both applications within the same machine.

New Ion Milling system for SEM Sample Prep

The IM4000 ion milling system features a new high-current Argon ion gun that delivers cross sectional milling rates of 300$)A&Lm/hr in Silicon for dramatically reduced cross-sectioning times. The wide Argon ion beam can define sharp cross sections even on samples of dissimilar materials with different hardness that cannot be cut or broken

3-axis CNC milling machine IM4000Plus Hitachi

Find out all of the information about the Hitachi High-Tech Europe GmbH product: 3-axis CNC milling machine IM4000Plus. Contact a supplier or the parent company directly to get a quote or to find out a price or your closest point of sale.

Hitachi Broad Beam Ion Mill Demo on Oct 24, 2018

2018-10-2  Hitachi and Geosciences to host a demo of IM40000Plus high-speed mill. The Hitachi IM4000 Ion Milling System was released in late 2010 as a device offering two key features: (a) as a hybrid ion-milling machine supporting both cross-section and flat milling—two widely used types of ion milling—the machine meets a wide variety of needs spanning the fields of material science and device

Flat Ion Milling System IM-3000 Hitachi High-Tech

Hitachi Flat Milling System Effective for removal of sample surface layer or the final finish of mechanical polish Desktop and Compact Design Available beam irradiation angle 0 to 90° Process the range of ö5 mm uniformly Maximum specimen size ö50mm×H25mm

Argon Ion Milling Machine CRUSHER Machine

Ion Beam Milling Systems Products Leica Microsystems. The em tic 3x milling machine offers triple ion beams that speed up the preparation process significantly and achieve to reveal finest details and structures on sample surfaces. watch the video and see how to cut the preparation time for ic gold wire bonding using the target surfacing system em txp and the em tic 3x ion beam milling system.

EMU Specimen Preparation Equipment UNSW Mark

Ion milling. Gatan PIPS Model 695 Hitachi IM4000 Ion Milling System. Coater. Leica ACE600 sputter coater Emitech K550x Gold sputter coater Emitech K575x Pt sputter coater Emitech K575x with Evaporative Carbon coating accessory JEOL JEE-420 Evaporative coater DCT Desktop Carbon coater. Ultramicrotome. Leica EM UC6 Ultramicrotome

Ion Beam Etch & Milling Systems Intlvac

Ion Beam Etch (IBE) & Milling technology allows films to be etched or deposited by the use of beams of charged ions in a high vacuum system. For etching (often called 'milling'), the ion beam is directed at the substrate that is patterned, or blank in some applications, and the bombardment of the substrate is well defined and controlled.

試料ホールダ Φ25mm Φ38mm Φ50mm MATIN

E.Milling by IM4000 Observation and analysis by SEM B.Resin embedding C.Rough polishing Razor, Precision cutting machine, Saw etc. Vacuum defoaming device (For resin), Heating device Waterproof abrasive paper (#800), Polishing machine SEM + EDS, WDS, EBSP etc. IM4000 Ion Milling System D.Setting of the specimen

New Ion Milling system for SEM Sample Prep

The IM4000 ion milling system features a new high-current Argon ion gun that delivers cross sectional milling rates of 300$)A&Lm/hr in Silicon for dramatically reduced cross-sectioning times. The wide Argon ion beam can define sharp cross sections even on samples of dissimilar materials with different hardness that cannot be cut or broken

IM4000 Plus Sigmatech Inc.

IM4000Plus Hybrid broad ion beam system for flatmilling ™, and Cross-section Milling in one unit. Traditional mechanical sample preparation via grinding and polishing can result in deformation, flaws, and artifacts that obscure the true structure of the material.

Hitachi Broad Beam Ion Mill Demo on Oct 24, 2018

2018-10-2  Hitachi and Geosciences to host a demo of IM40000Plus high-speed mill. The Hitachi IM4000 Ion Milling System was released in late 2010 as a device offering two key features: (a) as a hybrid ion-milling machine supporting both cross-section and flat milling—two widely used types of ion milling—the machine meets a wide variety of needs spanning the fields of material science and device

Hitachi Thermo Workshop

2014-2-11  An in-depth look at the Hitachi IM4000 ion milling system, presenting several diverse applications that are possible using this instrument. Broad ion beam milling is capable of sectioning large cross-section areas of various materials, and can accommodate metallurgical mounted samples for flat milling in one machine to process large areas in

Ion milling system 연구지원본부

Description The new Hitachi IM4000 Ar ion cross section and sample surface polisher makes two milling configurations available in a single instrument. Specifications • Type

EMU Specimen Preparation Equipment UNSW Mark

Ion milling. Gatan PIPS Model 695 Hitachi IM4000 Ion Milling System. Coater. Leica ACE600 sputter coater Emitech K550x Gold sputter coater Emitech K575x Pt sputter coater Emitech K575x with Evaporative Carbon coating accessory JEOL JEE-420 Evaporative coater DCT Desktop Carbon coater. Ultramicrotome. Leica EM UC6 Ultramicrotome

Flat Ion Milling System IM-3000 Hitachi High-Tech

Hitachi Flat Milling System Effective for removal of sample surface layer or the final finish of mechanical polish Desktop and Compact Design Available beam irradiation angle 0 to 90° Process the range of ö5 mm uniformly Maximum specimen size ö50mm×H25mm

RCOS: ION Milling RC Optical Systems

2015-10-24  Ion Beam Figuring works on a molecular (atomic) level. Without question, Ion Milling is the most important breakthrough ever in optical manufacturing! RCOS offers the HIGHEST QUALITY and most economical ION MILLED OPTICS possible in the 0.37m to 1.00m sizes. We have supplied hundreds of telescopes with ION Milled Optics. Ion Milling is

Effects of microstructure of Ni barrier on bonding

2020-3-15  The cross section of sinter Ag bonding was prepared using the ion-milling machine (IM4000, Hitachi, Japan), and the microstructure was observed by field-emission SEM (SU8020, Hitachi, Tokyo, Japan). TEM (JEM-ARM200F, JEOL) was employed to investigate the sputtered/electroplated Ni microstructure at 200 kV. Download : Download high-res image (161KB)

Petrophysical assessment of Australian organic-rich

2019-10-1  The Focused Ion Beam Scanning Electron Microscopy (FIB-SEM) images of the shale samples were obtained using a Carl Zeiss AURIGA CrossBeam machine. A 0.5 mm 2 surface area of the sample was milled with a low energy argon ion beam (Hitachi IM4000 ion milling machine). The samples were mounted on stubs using a resin and coated with platinum